The Rutherford County Schools Board of Education approved new zoning rules for high schools in the district at Tuesday’s school board meeting.¶
According to memos from the board, the new rules will create a dual zone between Blackman High School and Siegel High School due to recent population growth in those areas. The board previously approved new zones for high schools last fall, with the new zoning scheduled to take effect in August 2025. Board officials also previously stated that they would revisit the zone lines to make any growth adjustments before the 2025-2026 school year began. ¶
As part of the rezoning decision, board leaders said the district will allow parents of rising juniors and seniors to be “grandfathered” to remain at their current school if they have their own transportation. Parents will need to confirm their choice by Jan. 31, 2025.¶
In other related business, the board voted to finalize changes to elementary school zones that had been previously approved due to the addition of Poplar Hill Elementary School.¶
One parent expressed concerns about the controversial rezoning decisions during public comments, noting that her son has been “devastated” about the prospect of leaving Blackman.¶
“I am very worried about the potential impact this change will have on my child’s social and mental wellbeing,” she said.¶
“This [kind of] transition to a new school environment can be incredibly challenging, especially for students who have already established strong social connections and support systems at their current schools. For student athletes, this disruption can be even more significant.”¶
Despite such criticisms and concerns, RCS Director James Sullivan described the rezoning as a “necessary evil” due to enrollment projections in areas of the county where population growth is most pronounced.¶
“None of us like to rezone,” he said. “As a growing district, it’s something that we continually have to do.” ¶
For more information on the rezoning, visit Rutherford County Schools website at www.rcschools.net.¶
